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Quantum fluctuation of tunneling current in individual Ge quantum dots induced by a single-electron transfer

机译:单电子转移在单个Ge量子点中隧穿电流的量子涨落

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摘要

A scanning tunneling microscopic study revealed quantum fluctuation of tunneling currents in individual Ge quantum dots (QDs) on SiO_2/Si. This was due to the charging energy change in the QDs caused by single-electron transfer from or into the QDs. The observed electron discharging time of approximately milliseconds agreed with the propagation model of the electron wave packets from the QDs to the Si substrates by a tunneling effect rather than by passing through voids in the SiO_2 smaller than electron de Broglie wavelength.
机译:扫描隧道显微镜研究揭示了SiO_2 / Si上单个Ge量子点(QDs)中隧道电流的量子涨落。这是由于从QD或进入QD的单电子转移引起的QD中的充电能量变化。观察到的大约几毫秒的电子放电时间与电子波包从量子点到硅衬底的传播模型通过隧穿效应相符,而不是通过小于电子布罗意波长的SiO_2中的空隙。

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