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Effect of interfacial free energy on hydriding reaction of Mg-Ni thin films

机译:界面自由能对Mg-Ni薄膜氢化反应的影响

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The Mg_(2.9)Ni film with preferential orientated nanocrystalline structure was obtained by magnetron sputtering. The hydrogen storage properties and microstructure were investigated by pressure-composition-isotherms measurement, x-ray diffraction and transmission electron microscopy. A reversible hydrogen storage content of about 4.45 mass % at 497 K has been obtained. The preferential orientation of the deposited film was destroyed after only one hydrogenation/dehydrogenation cycle. Both experiment and simplified calculation results proved that the hydrogenation/dehydrogenation reaction temperature decreases due to the extra interfacial free energy stored in the boundary, which demonstrate that Mg based hydride can be substantially destabilized by inducing nanocrystalline structure.
机译:通过磁控溅射获得了具有优先取向的纳米晶结构的Mg_(2.9)Ni膜。通过压力-组成-等温线测量,X射线衍射和透射电子显微镜研究了储氢性能和微观结构。获得了在497 K下约4.45质量%的可逆储氢量。仅在一个加氢/脱氢循环后,沉积膜的优先取向被破坏。实验和简化的计算结果均证明,由于边界中存储了额外的界面自由能,加氢/脱氢反应温度降低,这表明通过诱导纳米晶体结构,Mg基氢化物可基本失稳。

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