Pulsed-laser deposited LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 thin films for application in microbatteries

摘要

LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 thin films were prepared by pulsed-laser deposition at varying growth conditions. It was found that the growth and microstructure of the films is highly dependent on the target composition, deposition temperature, and the reactive atmosphere during laser ablation. The x-ray diffraction and Raman spectroscopic measurements indicated the high-structural quality of the grown LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 thin films. A phase diagram mapping the effect of temperature on the microstructure of LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 thin films has been proposed. The measurements of charge-discharge profiles of Li microcells using the LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 films grown at 450℃ demonstrate their possible applications in microbatteries. A stable capacity of 98 μA h/cm~2 μm was obtained in the potential range of 4.2-2.5 V for LiNi_(0.8)Co_(0.15)Al_(0.05)O_2 films grown at 450℃.