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Effect of injection current density on electroluminescence in silicon quantum dot light-emitting diodes

机译:注入电流密度对硅量子点发光二极管中电致发光的影响

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摘要

We report the effect of injection current density on the electroluminescence (EL) from silicon quantum dot (QD) light-emitting diodes. The EL spectra as a function of injection current density were blueshifted and broad. These results are attributed to both the increase in the contribution of small Si QDs in the silicon nitride film due to the increase in the injection current density and the recombination of electron-hole pairs between excited states in the Si QDs due to band bending under high bias.
机译:我们报告了注入电流密度对来自硅量子点(QD)发光二极管的电致发光(EL)的影响。 EL光谱随注入电流密度的变化呈蓝移和宽泛。这些结果既归因于注入电流密度的增加导致氮化硅膜中小的Si QD的贡献增加,又归因于高强度下的能带弯曲导致的Si QDs中激发态之间的电子-空穴对复合。偏压。

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  • 来源
    《Applied Physicsletters》 |2009年第15期|153103.1-153103.3|共3页
  • 作者单位

    Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA;

    Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213, USA;

    Department of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea;

    Department of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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