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Effect of contamination on the electronic structure and hole-injection properties of MoO_3/organic semiconductor interfaces

机译:污染对MoO_3 /有机半导体界面电子结构和空穴注入性能的影响

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摘要

The electronic structure and hole-injection properties of ambient contaminated molybdenum trioxide (MoO_3) surfaces are studied by ultraviolet and inverse photoemission spectroscopy, and current-voltage measurements. Contamination reduces the work function (WF), electron affinity (EA) and ionization energy by about 1 eV with respect to the freshly evaporated film, to values of 5.7 eV, 5.5 eV, and 8.6 eV, respectively. However, the WF and EA remain sufficiently large that the hole-injection properties of MoO_3 are not affected by contamination. The results are of particular importance in view of potential applications of transition metal oxides for low-cost manufacturing of devices in low-vacuum or nonvacuum environment.
机译:通过紫外和反向光发射光谱以及电流-电压测量研究了环境污染的三氧化钼(MoO_3)表面的电子结构和空穴注入性质。相对于新蒸发的膜,污染将功函(WF),电子亲和力(EA)和电离能分别降低了约1 eV,分别为5.7 eV,5.5 eV和8.6 eV。但是,WF和EA保持足够大,以致MoO_3的空穴注入性能不受污染的影响。考虑到过渡金属氧化物在低真空或非真空环境中低成本制造器件的潜在应用,结果特别重要。

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  • 来源
    《Applied Physicsletters》 |2010年第13期|p.133308.1-133308.3|共3页
  • 作者单位

    Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA;

    Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA;

    InnovationLab GmbH, Speyerer Strasse 4, 69115 Heidelberg, Germany;

    Department of Electrical Engineering, Princeton University, Princeton, New Jersey 08544, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:18:48

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