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首页> 外文期刊>Applied Physicsletters >The effect of moisture on the photon-enhanced negative bias thermal instability in Ga-In-Zn-O thin film transistors
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The effect of moisture on the photon-enhanced negative bias thermal instability in Ga-In-Zn-O thin film transistors

机译:水分对Ga-In-Zn-O薄膜晶体管中光子增强的负偏置热不稳定性的影响

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We investigated the impact of photon irradiation on the stability of gallium-indium-zinc oxide (GIZO) thin film transistors. The application of light on the negative bias temperature stress (NBTS) accelerated the negative displacement of the threshold voltage (V_(th)). This phenomenon can be attributed to the trapping of the photon-induced carriers into the gate dielectric/channel interface or the gate dielectric bulk. Interestingly, the negative V_(th) shift under photon-enhanced NBTS condition worsened in relatively humid environments. It is suggested that moisture is a significant parameter that induces the degradation of bias-stressed GIZO transistors.
机译:我们研究了光子辐照对镓铟锌氧化物(GIZO)薄膜晶体管稳定性的影响。将光施加到负偏置温度应力(NBTS)上会加速阈值电压(V_(th))的负位移。该现象可归因于光子感应的载流子捕获到栅极电介质/沟道界面或栅极电介质块中。有趣的是,在相对湿润的环境中,光子增强NBTS条件下的负V_(th)位移会恶化。建议水分是引起偏置应力GIZO晶体管性能下降的重要参数。

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  • 来源
    《Applied Physicsletters》 |2010年第23期|232106.1-232106.3|共3页
  • 作者单位

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Department of Materials Science and Engineering, Inha Univeristy, 253 Yonghyun-Dong, Nam-Gu, Incheon 402-751, Republic of Korea;

    Department of Materials Science and Engineering, Inha Univeristy, 253 Yonghyun-Dong, Nam-Gu, Incheon 402-751, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

    Display Laboratory, Samsung Advanced Institute of Technology, Mt. 14-1, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do 446-712, Republic of Korea;

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  • 正文语种 eng
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