首页> 外文期刊>Applied Physics Letters >Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment
【24h】

Investigating the improvement of resistive switching trends after post-forming negative bias stress treatment

机译:研究形成后的负偏应力处理后电阻切换趋势的改善

获取原文
获取原文并翻译 | 示例
       

摘要

This paper investigates the improvement of resistive switching trends after post-forming negative bias stress treatment of a Pt/YbjOa/TiN device that has undergone positive bias forming process for activation. After the treatment, characteristics of the conductive filament, such as the temperature dependence of resistivity and transition mechanism, undergo changes. Furthermore, this treatment causes the conductive filament to transform from being primarily composed of vacancies to being metallic Yb dominant, which not only reduces operation voltages such as Vset and Vreset but also improves the on/off ratio. In reliability tests, the device has stable retention.
机译:本文研究了对Pt / YbjOa / TiN器件进行后偏置负偏置应力处理后的电阻切换趋势的改善,该器件已经过激活的正偏置形成过程。处理后,导电丝的特性,例如电阻率和转变机理的温度依赖性,发生变化。此外,这种处理导致导电细丝从主要由空位构成转变为以金属Yb为主,这不仅降低了诸如Vset和Vreset的工作电压,而且还改善了导通/截止比。在可靠性测试中,该设备具有稳定的保持力。

著录项

  • 来源
    《Applied Physics Letters》 |2011年第13期|p.115-117|共3页
  • 作者单位

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan,Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Electro-Optical Engineering, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Electro-Optical Engineering, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Institute of Electronics, National Chiao Tung University, Hsinchu 300, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan,Department of Electrical Engineering, Stanford University, Stanford, California 94305-4085, USA;

    Electronics and Optoelectronics Research Laboratory, Industrial Technology Research Institute, Chutung,Hsinchu 310, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:18:09

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号