机译:在非常低的压力下工作的高度电离的物理气相沉积等离子体源
Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6,17489 Greifswald, Germany;
Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6,17489 Greifswald, Germany;
Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6,17489 Greifswald, Germany;
Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2,182 21 Prague, Czech Republic;
Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2,182 21 Prague, Czech Republic;
Faculty of Mathematics and Physics, Charles University in Prague, V Holesovickach 2,180 00 Prague, Czech Republic;
Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6,17489 Greifswald, Germany;
机译:在非常低的压力下工作的高度电离的物理气相沉积等离子体源
机译:使用空心阴极磁控管等离子体源原位物理气相沉积离子化的Ti和TiN薄膜
机译:用于电离物理气相沉积的Helicon等离子体源
机译:等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
机译:对离子化金属物理气相沉积中的等离子设备和特征轮廓进行建模。
机译:直接模拟蒙特卡洛法研究载气流速和源电池温度对低压有机气相沉积模拟的影响
机译:通过极低压等离子体喷涂和等离子体喷涂物理气相沉积工艺制备致密的钆掺杂的二氧化铈涂层