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Si quantum dots with a high absorption coefficient: Analysis based on both intensive and extensive variables

机译:具有高吸收系数的Si量子点:基于密集变量和广泛变量的分析

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摘要

Silicon quantum dots (Si-QDs) were produced by pulsed laser ablation in liquid. By measuring the absorption spectra and the concentration of the Si-QD solution, two extinction coefficients were obtained from UV to near IR region: the atomic molar extinction coefficient and the quantum dot molar extinction coefficient. The magnitude of the atomic molar extinction coefficient of the Si-QDs was found to be up to 30 and 270 times those of crystalline and amorphous Si, respectively, and up to 740 times that of previously fabricated Si-QDs. The Si-QDs remained stably dispersed in hydrocarbon and alcohol solvents for over 10 months.
机译:硅量子点(Si-QDs)是通过在液体中进行脉冲激光烧蚀产生的。通过测量吸收光谱和Si-QD溶液的浓度,从紫外线到近红外区域获得了两个消光系数:原子摩尔消光系数和量子点摩尔消光系数。发现Si-QD的原子摩尔消光系数的大小分别是结晶Si和非晶Si的原子摩尔消光系数的30倍和270倍,并且是先前制造的Si-QD的原子摩尔消光系数的740倍。 Si-QD稳定地分散在碳氢化合物和醇类溶剂中超过10个月。

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  • 来源
    《Applied Physics Letters》 |2013年第15期|151912.1-151912.5|共5页
  • 作者单位

    Department of Chemistry, Graduate School of Science, Hiroshima University, 1-3-1 Kagamiyama, Higashi-hiroshima, Hiroshima 739-8526, Japan;

    Department of Chemistry, Graduate School of Science, Hiroshima University, 1-3-1 Kagamiyama, Higashi-hiroshima, Hiroshima 739-8526, Japan,Natural Science Center for Basic Research and Development (N-BARD), Hiroshima University, 1-3-1 Kagamiyama, Higashi-hiroshima, Hiroshima 739-8526, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:41

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