首页> 外文期刊>Applied Physics Letters >Direct measurement of donor-like interface state density and energy distribution at insulator/AlGaN interface in metal/Al_2O_3/AlGaN/GaN by photocapacitance method
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Direct measurement of donor-like interface state density and energy distribution at insulator/AlGaN interface in metal/Al_2O_3/AlGaN/GaN by photocapacitance method

机译:通过光电容法直接测量金属/ Al_2O_3 / AlGaN / GaN中绝缘体/ AlGaN界面上的施主样界面态密度和能量分布

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摘要

We determined the energy distribution of donor-like interface state density D_(itD)(E) at the Al_2O_3/ AlGaN interface in a metal/Al_2O_3/AlGaN/GaN heterostructure (MISH) capacitor. In this order, we developed a point-by-point graphical method based on the measurement and simulations of the MISH photocapacitance versus ultraviolet light intensity. We found a tail-like shaped D_(itD)(E) strongly decreasing from the value of 5 × 10~(13) to 4 × 10~(12) eV~(-1) cm~(-2) in the energv range between 0.12 eV and 0.45 eV from the AlGaN valence band edge.
机译:我们确定了金属/ Al_2O_3 / AlGaN / GaN异质结构(MISH)电容器中Al_2O_3 / AlGaN界面处的施主样界面态密度D_(itD)(E)的能量分布。按此顺序,我们基于MISH光电容与紫外光强度的测量和模拟,开发了一个逐点图形方法。我们发现能量中尾状的D_(itD)(E)从5×10〜(13)的值急剧减小到4×10〜(12)eV〜(-1)cm〜(-2) AlGaN价带边缘的范围为0.12 eV至0.45 eV。

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  • 来源
    《Applied Physics Letters》 |2013年第2期|021603.1-021603.4|共4页
  • 作者单位

    Institute of Physics-Center for Science and Education, Silesian University of Technology,Krzywoustego 2, 44-100 Gliwice, Poland;

    Institute of Physics-Center for Science and Education, Silesian University of Technology,Krzywoustego 2, 44-100 Gliwice, Poland;

    Research Center for Integrated Quantum Electronics, Hokkaido University, Kita-13 Nishi-8,Kita-ku, 060-8628 Sapporo, Japan;

    Research Center for Integrated Quantum Electronics, Hokkaido University, Kita-13 Nishi-8,Kita-ku, 060-8628 Sapporo, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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