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Hopping conduction distance dependent activation energy characteristics of Zn:SiO_2 resistance random access memory devices

机译:Zn:SiO_2电阻随机存取存储器件的跳跃传导距离相关活化能特性

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摘要

In this study, the hopping conduction distance variation of Zn:SiO_2 resistance random access memory (RRAM) devices with different operating compliance currents was discussed and verified. To investigate and determine the hopping conduction distance dependent activation energy characteristics, the Arrhenius plot of low resistance state of Zn:SiO_2 RRAM devices was applied, from which we proposed carrier conduction model. With the increase of current compliance, more metal ions would accumulate to form precipitates with larger diameter, which in turn resulted in the shortening of hopping distance. Because of shorter hopping distance, activation energy for carrier hopping would decrease.
机译:在这项研究中,讨论并验证了具有不同工作顺应电流的Zn:SiO_2电阻随机存取存储器(RRAM)器件的跳跃传导距离变化。为了研究和确定跳跃传导距离相关的活化能特性,应用了Zn:SiO_2 RRAM器件的低电阻状态的阿伦尼乌斯图,由此提出了载流子传导模型。随着电流顺应性的增加,更多的金属离子将积累形成更大直径的沉淀物,从而导致跳变距离的缩短。由于跳跃距离较短,因此用于载波跳跃的激活能量将降低。

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  • 来源
    《Applied Physics Letters》 |2013年第13期|133503.1-133503.3|共3页
  • 作者单位

    Department of Electronics Engineering and Computer Science, Tung-Fang Design University, Kaohsiung, Taiwan;

    School of Software and Microelectronics, Peking University, Beijing 100871, People's Republic of China;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan,Advanced Optoelectronics Technology Center, National Cheng Kung University, Tainan 700, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 804, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 804, Taiwan;

    School of Software and Microelectronics, Peking University, Beijing 100871, People's Republic of China;

    Department of Mechanical and Electro-Mechanical Engineering, National Sun Yat-Sen University, Kaohsiung, Taiwan;

    Department of Chemistry, National Kaohsiung Normal University, Kaohsiung, Taiwan;

    Department of Chemistry, National Kaohsiung Normal University, Kaohsiung, Taiwan;

    Department of Materials and Optoelectronic Science, National Sun Yat-Sen University, Kaohsiung, 804, Taiwan;

    Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;

    Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:16:24

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