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Electrically injected near-infrared light emission from single InN nanowire p-i-n diode

机译:来自单个InN纳米线p-i-n二极管的电注入近红外光发射

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摘要

We report on the achievement of electroluminescence emission of single InN p-i-n nanowire devices. InN p-i-n nanowire structures were grown directly on Si substrate by plasma-assisted molecular beam epitaxy and subsequently transferred to foreign substrate for the fabrication of single nanowire light emitting diodes. Electroluminescence emission with a peak energy of 0.71 eV (1.75 μm) was observed at 77 K. The measurement of near-bandgap electroluminescence provides unambiguous evidence for the achievement of p-type conduction of InN.
机译:我们报告了单个InN p-i-n纳米线器件的电致发光发射的成就。 InN p-i-n纳米线结构通过等离子辅助分子束外延直接在Si衬底上生长,然后转移到异质衬底上,以制造单个纳米线发光二极管。在77 K处观察到具有0.71 eV(1.75μm)峰值能量的电致发光。近带隙电致发光的测量为InN的p型导电提供了明确的证据。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第23期|231124.1-231124.3|共3页
  • 作者单位

    Department of Electrical and Computer Engineering, McGill University, 3480 University Street, Montreal, Quebec H3A 0E9, Canada;

    Department of Electrical and Computer Engineering, McGill University, 3480 University Street, Montreal, Quebec H3A 0E9, Canada;

    Department of Electrical and Computer Engineering, McGill University, 3480 University Street, Montreal, Quebec H3A 0E9, Canada;

    Department of Electrical and Computer Engineering, McGill University, 3480 University Street, Montreal, Quebec H3A 0E9, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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