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Temperature and field dependent effective hole mobility and impact ionization at extremely high fields in amorphous selenium

机译:取决于温度和场的有效空穴迁移率以及非晶态硒中极高场的碰撞电离

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摘要

An analytical model for the electric field and temperature dependent effective drift mobility of holes in amorphous selenium (a-Se) has been developed by considering density of states distribution near the valence band, field enhancement release rate from the shallow traps, and carrier heating. The models for the field-dependent microscopic mobility and momentum relaxation mean free path considering carrier heating are also proposed. The models are fitted with the published experimental results on effective hole mobility and impact ionization with wide variations of applied electric fields and temperatures. The fittings of the model with the published experimental data on the effective hole mobility reveal that, while the effective hole drift mobility increases with increasing temperature and field, the microscopic mobility and momentum relaxation mean free path in a-Se decreases with increasing electric field. A better fitting considering thermally activated tunneling for the field-enhancement release rate indicates that the shallow hole traps in a-Se are neutral defects.
机译:通过考虑价带附近的态分布密度,浅阱的场增强释放速率和载流子加热,开发了一种用于分析非晶态硒(a-Se)中空穴与电场和温度相关的有效漂移迁移率的分析模型。还提出了考虑载流子加热的场相关微观迁移率和动量松弛平均自由程的模型。这些模型与已公开的有关有效空穴迁移率和碰撞电离的实验结果相吻合,并且施加的电场和温度变化很大。模型与已发表的有关有效空穴迁移率的实验数据的拟合表明,尽管有效空穴漂移迁移率随温度和电场的增加而增加,但a-Se中的微观迁移率和动量松弛平均自由程随电场的增加而降低。考虑到热激活隧穿对场增强释放速率的更好拟合表明,a-Se中的浅孔陷阱是中性缺陷。

著录项

  • 来源
    《Applied Physics Letters》 |2014年第19期|192103.1-192103.4|共4页
  • 作者

    M. Z. Kabir; Nour Hijazi;

  • 作者单位

    Department of Electrical and Computer Engineering, Concordia University, 1455 Blvd. de Maisonneuve West,Montreal, Quebec H3G 1M8, Canada;

    Department of Electrical and Computer Engineering, Concordia University, 1455 Blvd. de Maisonneuve West,Montreal, Quebec H3G 1M8, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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