机译:快速I-Ⅴ测量研究TiN / HfO_2结构输入/输出n沟道金属氧化物半导体场效应晶体管在正偏置应力下的负阈值电压异常漂移
Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;
Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;
Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;
Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;
Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;
Department of Physics, National Sun Yat-Sen University, Kaohsiung 804, Taiwan;
Department of Electronics Engineering, National Chiao Tung University, Hsinchu 300, Taiwan;
Device Department, United Microelectronics Corporation, Tainan Science Park, Taiwan;
Device Department, United Microelectronics Corporation, Tainan Science Park, Taiwan;
Device Department, United Microelectronics Corporation, Tainan Science Park, Taiwan;
机译:使用快速I-V测量研究具有TiN / HfO2结构的输入/输出n沟道金属氧化物半导体场效应晶体管在正偏置应力下的异常负阈值电压偏移
机译:Ti_(1-x)N_x / HfO_2 p沟道金属氧化物半导体场效应晶体管在热载流子应力下阈值电压异常漂移
机译:正偏置温度不稳定性中的负阈值电压漂移和掺钇的HfO_2栅介质的负偏置温度不稳定性的正阈值电压漂移的研究
机译:负栅极偏置对n沟道多晶硅薄膜晶体管阈值电压漂移的极性变化
机译:具有ZrO2栅极电介质的n沟道金属氧化物半导体场效应晶体管的正偏置温度不稳定性