机译:平面内应变对基体中原位感应应变对Mn掺杂BiFeO_3外延膜铁电性能的内在和定量影响
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
Department of Physics, Beijing Normal University, Beijing 100875, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
Department of Physics, Beijing Normal University, Beijing 100875, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
Hefei National Laboratory for Physical Sciences at Microscale and Department of Physics, University of Science and Technology of China, Hefei 230026, China;
State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;
机译:平面应变对基体中原位感应应变对掺锰的BiFeO3外延膜铁电性能的内在和定量影响
机译:外延应变和电边界条件对BiFeO_3薄膜结构和铁电性能的影响
机译:外延BiFeO_3薄膜的应变效应和铁电性质的厚度依赖性。
机译:La_(0.6)Sr_(0.2)Mn_(1.2)O_3薄膜的磁输运性质:薄膜厚度和基底诱导应变的影响
机译:各向异性衬底上外延铁电薄膜的应变工程
机译:硅上外延PbZr0.45Ti0.55O3薄膜的铁电和压电特性的固有稳定性与晶粒倾斜的关系
机译:面内剪切应变对外延铁电薄膜相态和介电性能的影响