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A method to determine the number of nanoparticles in a cluster using conventional optical microscopes

机译:使用常规光学显微镜确定簇中纳米颗粒数量的方法

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摘要

We present a method that uses conventional optical microscopes to determine the number of nanoparticles in a cluster, which is typically not possible using traditional image-based optical methods due to the diffraction limit. The method, called through-focus scanning optical microscopy (TSOM), uses a series of optical images taken at varying focus levels to achieve this. The optical images cannot directly resolve the individual nanoparticles, but contain information related to the number of particles. The TSOM method makes use of this information to determine the number of nanoparticles in a cluster. Initial good agreement between the simulations and the measurements is also presented. The TSOM method can be applied to fluorescent and non-fluorescent as well as metallic and non-metallic nano-scale materials, including soft materials, making it attractive for tag-less, high-speed, optical analysis of nanoparticles down to 45 nm diameter.
机译:我们提出一种使用常规光学显微镜确定簇中纳米颗粒数量的方法,由于衍射极限,使用传统的基于图像的光学方法通常是不可能的。该方法称为全焦点扫描光学显微镜(TSOM),它使用一系列以不同焦点级别拍摄的光学图像来实现这一目的。光学图像无法直接解析单个纳米粒子,但包含与粒子数量有关的信息。 TSOM方法利用此信息来确定簇中纳米颗粒的数量。还介绍了模拟与测量之间的初始良好一致性。 TSOM方法可应用于荧光和非荧光以及金属和非金属纳米级材料,包括软材料,使其对直径小于45 nm的纳米粒子的无标签,高速,光学分析具有吸引力。

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  • 来源
    《Applied Physics Letters》 |2015年第10期|103106.1-103106.4|共4页
  • 作者单位

    Semiconductor and Dimensional Metrology Division, PML, NIST, Gaithersburg, Maryland 20899, USA;

    Semiconductor and Dimensional Metrology Division, PML, NIST, Gaithersburg, Maryland 20899, USA;

    Semiconductor and Dimensional Metrology Division, PML, NIST, Gaithersburg, Maryland 20899, USA;

    Semiconductor and Dimensional Metrology Division, PML, NIST, Gaithersburg, Maryland 20899, USA;

    Semiconductor and Dimensional Metrology Division, PML, NIST, Gaithersburg, Maryland 20899, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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