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The n-type conduction of indium-doped Cu_2O thin films fabricated by direct current magnetron co-sputtering

机译:直流磁控共溅射制备铟掺杂Cu_2O薄膜的n型导电

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摘要

Indium-doped Cu_2O thin films were fabricated on K9 glass substrates by direct current magnetron co-sputtering in an atmosphere of Ar and O_2. Metallic copper and indium disks were used as the targets. X-ray diffraction showed that the diffraction peaks could only be indexed to simple cubic Cu_2O, with no other phases detected. Indium atoms exist as In~(3+) in Cu_2O. Ultraviolet-visible spec-troscopy showed that the transmittance of the samples was relatively high and that indium doping increased the optical band gaps. The Hall effect measurement showed that the samples were n-type semiconductors at room temperature. The Seebeck effect test showed that the films were n-type semiconductors near or over room temperature (<400K), changing to p-type at relatively high temperatures. The conduction by the samples in the temperature range of the n-type was due to thermal band conduction and the donor energy level was estimated to be 620.2-713.8 meV below the conduction band. The theoretical calculation showed that indium doping can raise the Fermi energy level of Cu_2O and, therefore, lead to n-type conduction.
机译:通过在Ar和O_2气氛中进行直流磁控共溅射,在K9玻璃基板上制备了掺铟的Cu_2O薄膜。金属铜和铟盘用作靶。 X射线衍射表明,衍射峰只能指向简单的立方Cu_2O,没有检测到其他相。铟原子以In〜(3+)的形式存在于Cu_2O中。紫外可见光谱表明,样品的透射率相对较高,并且铟掺杂增加了光学带隙。霍尔效应测量表明,样品在室温下为n型半导体。 Seebeck效应测试表明,薄膜是接近或高于室温(<400K)的n型半导体,在相对较高的温度下变为p型。样品在n型温度范围内的传导是由于热带传导引起的,供体能级估计为比传导带低620.2-713.8 meV。理论计算表明,铟掺杂可以提高Cu_2O的费米能级,从而导致n型导电。

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  • 来源
    《Applied Physics Letters》 |2015年第8期|083901.1-083901.5|共5页
  • 作者单位

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Institute of Thin Film Physics and Applications, School of Physical Science and Technology and Shenzhen Key Laboratory of Sensor Technology, Shenzhen University, Shenzhen 518060, China;

    Center of Super-Diamond and Advanced Films (COSDAF) and Department of Physics and Materials Science, City University of Hong Kong, Kowloon Tong, Hong Kong, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:15:20

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