机译:完全由ALD生长的TiN / Hf_(0.5)Zr_(0.5)O_2 / TiN叠层:铁电和结构性质
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia,A.V. Shubnikov Institute of Crystallography of Russian Academy of Sciences, Moscow 119333, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia;
Moscow Institute of Physics and Technology, Dolgoprudny, Moscow Region 141700, Russia,NRNU 'Moscow Engineering Physics Institute,' Moscow 115409, Russia;
机译:金属铁电 - 金属 - 绝缘体 - 半导体栅极堆栈结构的存储器和逻辑应用的铁电场效应晶体管设计点,使用HF_(0.5)Zr_(0.5)O_2膜
机译:TiN和Ir电极上Hf_(0.5)Zr_(0.5)O_2薄膜铁电性能的退化机理研究
机译:TiN_x / Hf_(0.5)Zr_(0.5)O_2 / TiN_x铁电存储器具有可调的透明性和抑制的唤醒作用
机译:通过插入AL_2O_3,改善TIN / HF_(0.5)ZR_(0.5)ZR_(0.5)O_2 / SI栅极堆栈的铁电性能界面层
机译:铁电铅(Zirconium0.5,Titanium0.5)Oxygen3纳米管阵列的结构特性和老挝掺杂的钛酸锶锶的电子结构。
机译:无铅(Ka0.5Na0.5)NbO3和BiFeO3基压电陶瓷的铁电畴结构和局部压电性能
机译:BiFeO3-(K0.5Bi0.5)TiO3-pbTiO3陶瓷中弛豫类/铁电连续体的压电特性和机制的变化