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Reverse-bias-driven dichromatic electroluminescence of n-ZnO wire arrays/p-GaN film heterojunction light-emitting diodes

机译:n-ZnO线阵列/ p-GaN薄膜异质结发光二极管的反向偏置驱动双色电致发光

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摘要

Position-controlled n-ZnO microwire (MW) and nanowire-bundle (NW-B) arrays were fabricated using hydrothermal growth of ZnO on a patterned p-GaN film. Both the wire/film p-n heterojunc-tions showed electrical rectification features at reverse-bias (rb) voltages, analogous to backward diodes. Dichromatic electroluminescence (EL) emissions with 445- and 560-nm-wavelength peaks displayed whitish-blue and greenish-yellow light from MW- and NW-B-based heterojunctions at rb voltages, respectively. The different dichromatic EL emission colors were studied based on photo-luminescence spectra and the dichromatic EL peak intensity ratios as a function of the rb voltage. The different EL colors are discussed with respect to depletion thickness and electron tunneling probability determined by wire/film junction geometry and size.
机译:位置控制的n-ZnO微线(MW)和纳米线束(NW-B)阵列是通过在图案化的p-GaN膜上水热生长ZnO制成的。导线/薄膜p-n异质结均在反向偏置(rb)电压下显示出整流特性,类似于反向二极管。具有445和560 nm波长峰值的双色电致发光(EL)发射分别在rb电压下显示来自基于MW和基于NW-B的异质结的发白蓝色和发绿黄色的光。基于光致发光光谱和双色EL峰强度比作为rb电压的函数,研究了不同的双色EL发射色。关于由线/膜结的几何形状和尺寸确定的耗尽厚度和电子隧穿概率,讨论了不同的EL颜色。

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  • 来源
    《Applied Physics Letters》 |2016年第10期|101103.1-101103.5|共5页
  • 作者单位

    Faculty of Nanoscience and Advanced Materials Engineering, Graphene Research Institute, and Hybrid Materials Research Center, Sejong University, Seoul 05006, South Korea;

    Faculty of Nanoscience and Advanced Materials Engineering, Graphene Research Institute, and Hybrid Materials Research Center, Sejong University, Seoul 05006, South Korea;

    School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom;

    Department of Materials Science and Engineering, Pohang University of Science and Technology(POSTECH), Pohang 790-784, South Korea;

    Department of Materials Science and Engineering, KAIST, Daejeon 34141, South Korea;

    Department of Materials Science and Engineering, Pohang University of Science and Technology(POSTECH), Pohang 790-784, South Korea;

    UNIST Central Research Facilities (UCRF), UNIST, Ulsan 44919, South Korea;

    Faculty of Nanoscience and Advanced Materials Engineering, Graphene Research Institute, and Hybrid Materials Research Center, Sejong University, Seoul 05006, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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