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Effect of intermixing at CdS/CdTe interface on defect properties

机译:CdS / CdTe界面混合对缺陷性质的影响

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摘要

We investigated the stability and electronic properties of defects in CdTe_(1-x)S_x that can be formed at the CdS/CdTe interface. As the anions mix at the interface, the defect properties are significantly affected, especially those defects centered at cation sites like Cd vacancy, V_(Cd), and Te on Cd antisite, Te_(Cd), because the environment surrounding the defect sites can have different configurations. We show that at a given composition, the transition energy levels of V_(Cd) and Te_(Cd) become close to the valence band maximum when the defect has more S atoms in their local environment, thus improving the device performance. Such beneficial role is also found at the grain boundaries when the Te atom is replaced by S in the Te-Te wrong bonds, reducing the energy of the grain boundary level. On the other hand, the transition levels with respect to the valence band edge of CdTe_(1-x)S_x increases with the S concentration as the valence band edge decreases with the S concentration, resulting in the reduced p-type doping efficiency.
机译:我们研究了可在CdS / CdTe界面形成的CdTe_(1-x)S_x缺陷的稳定性和电子性质。当阴离子在界面处混合时,缺陷性质会受到显着影响,尤其是那些集中在阳离子位点(例如Cd空位,V_(Cd)和Cd反位点Te_(Cd)上的Te)的缺陷,因为缺陷位点周围的环境可以具有不同的配置。我们表明,在给定的成分下,当缺陷的局部环境中有更多S原子时,V_(Cd)和Te_(Cd)的跃迁能级接近价带最大值,从而提高了器件性能。当在Te-Te错键中将Te原子替换为S时,在晶界处也会发现这种有益作用,从而降低了晶界能级。另一方面,随着S浓度,CdTe_(1-x)S_x的价带边缘的跃迁电平随着S浓度的增加而增加,导致p型掺杂效率降低。

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  • 来源
    《Applied Physics Letters》 |2016年第4期|042105.1-042105.4|共4页
  • 作者单位

    National Renewable Energy Laboratory, Golden, Colorado 80401, USA,Argonne National Laboratory, 9700 Cass Ave., Lemont, IL 60439, USA;

    National Renewable Energy Laboratory, Golden, Colorado 80401, USA;

    National Renewable Energy Laboratory, Golden, Colorado 80401, USA;

    Beijing Computational Science Research Center, Beijing 100094, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:14:43

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