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Electrical characteristics of MoS_2 field-effect transistor with ferroelectric vinylidene fluoride-trifluoroethylene copolymer gate structure

机译:具有铁电偏二氟乙烯-三氟乙烯共聚物栅极结构的MoS_2场效应晶体管的电学特性

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摘要

Ferroelectric field-effect transistors (FeFET) based on MoS_2 have recently been shown to exhibit considerable potential for use in nano sized non-volatile memory devices. Here, we demonstrated fabrication and characterization of FeFET based on MoS_2 channel with vinylidene fluoride (VDF)-trifluoroethylene (TrFE) copolymer as back-gate insulator. In this device, counterclockwise hysteresis behavior was observed in the drain current-gate voltage curve, which is indicative of interaction between MoS_2 carrier modulation and ferroelectric polarization switching. Furthermore, our VDF-TrFE/MoS_2 FeFET exhibited only n-type behavior, a maximum linear mobility of 625 cm~2/V s, a large memory window width of 16 V, and a high on/off current ratio of 8 × 10~5.
机译:最近已经显示出基于MoS_2的铁电场效应晶体管(FeFET)具有相当大的潜力,可用于纳米级非易失性存储设备。在这里,我们展示了以偏二氟乙烯(VDF)-三氟乙烯(TrFE)共聚物作为背栅绝缘体的基于MoS_2通道的FeFET的制备和表征。在该器件中,在漏极电流-栅极电压曲线中观察到了逆时针方向的磁滞行为,这表明MoS_2载流子调制与铁电极化切换之间存在相互作用。此外,我们的VDF-TrFE / MoS_2 FeFET仅表现出n型行为,最大线性迁移率为625 cm〜2 / V s,较大的存储窗口宽度为16 V,并且具有较高的开/关电流比8×10 〜5。

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  • 来源
    《Applied Physics Letters》 |2016年第13期|132903.1-132903.4|共4页
  • 作者单位

    Graduate School of Natural Science and Technology, Kanazawa University, Kanazawa, Ishikawa 920-1192, Japan;

    College of Science and Engineering, Kanazawa University, Kanazawa, Ishikawa 920-1192, Japan;

    Department of Applied Physics, Tokyo University of Science, Katsushika-ku, Tokyo 125-8585, Japan;

    College of Science and Engineering, Kanazawa University, Kanazawa, Ishikawa 920-1192, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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  • 入库时间 2022-08-18 03:14:36

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