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Gd-doped BaSnO_3: A transparent conducting oxide with localized magnetic moments

机译:掺Gd的BaSnO_3:具有局部磁矩的透明导电氧化物

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摘要

We have synthesized transparent, conducting, paramagnetic stannate thin films via rare-earth doping of BaSnO_3. Gd~(3+) (4f~7) substitution on the Ba~(2+) site results in optical transparency in the visible regime, low resistivities, and high electron mobilities, along with a significant magnetic moment. Pulsed laser deposition was used to stabilize epitaxial Ba_(0.96)Gd_(0.04)SnO_3 thin films on (001) SrTiO_3 substrates, and compared with Ba_(0.96)La_(0.04)SnO_3 and undoped BaSnO_3 thin films. Gd as well as La doping schemes result in electron mobilities at room temperature that exceed those of conventional complex oxides, with values as high as 60cm~2/V·s (n = 2.5 × 10~(20)cm~(-3)) and 30cm~2/V·s (n = 1 × 10~(20)cm~(-3)) for La and Gd doping, respectively. The resistivity shows little temperature dependence across a broad temperature range, indicating that in both types of films the transport is not dominated by phonon scattering. Gd-doped BaSnO_3 films have a strong magnetic moment of ~7 μB/Gd ion. Such an optically transparent conductor with localized magnetic moments may unlock opportunities for multifunctional devices in the design of next-generation displays and photovoltaics.
机译:我们通过稀土掺杂BaSnO_3合成了透明,导电,顺磁性的锡酸盐薄膜。 Ba〜(2+)位点上的Gd〜(3+)(4f〜7)取代导致可见态的光学透明,低电阻率和高电子迁移率,以及明显的磁矩。采用脉冲激光沉积在(001)SrTiO_3衬底上稳定外延Ba_(0.96)Gd_(0.04)SnO_3薄膜,并与Ba_(0.96)La_(0.04)SnO_3和未掺杂的BaSnO_3薄膜进行比较。 Gd和La掺杂方案在室温下的电子迁移率超过了传统的复合氧化物,其电子迁移率高达60cm〜2 / V·s(n = 2.5×10〜(20)cm〜(-3) )和La和Gd掺杂分别为30cm〜2 / V·s(n = 1×10〜(20)cm〜(-3))。电阻率在很宽的温度范围内几乎没有温度依赖性,这表明在两种类型的薄膜中,传输都不受声子散射的支配。掺Gd的BaSnO_3薄膜具有约7μB/ Gd离子的强磁矩。具有局部磁矩的这种光学透明导体可以在下一代显示器和光伏器件的设计中释放多功能设备的机会。

著录项

  • 来源
    《Applied Physics Letters》 |2016年第4期|042106.1-042106.4|共4页
  • 作者单位

    Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA,Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA;

    Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA,Department of Applied Physics, Stanford University, Stanford, California 94305, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:37

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