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Investigation of high density two-dimensional electron gas in Zn-polar BeMgZnO/ZnO heterostructures

机译:Zn极性BeMgZnO / ZnO异质结构中高密度二维电子气的研究

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摘要

Zn-polar BeMgZnO/ZnO heterostructures grown by molecular beam epitaxy on high resistivity GaN templates producing high-density two-dimensional electron gas (2DEG) are investigated. This is motivated by the need to reach plasmon-longitudinal optical (LO) phonon resonance for attaining minimum LO phonon lifetime. Achievement of high 2DEG concentration in MgZnO/ZnO heterostructures requires growth of the MgZnO barrier at relatively low temperatures, which compromises the ternary quality that in turn hinders potential field effect transistor performance. When this ternary is alloyed further with BeO, the sign of strain in the BeMgZnO barrier on ZnO switches from compressive to tensile, making the piezoelectric and spontaneous polarizations to be additive in the BeMgZnO/ZnO heterostructures much like the Ga-polar AlGaN/GaN heterostructures. As a result, a 2DEG concentration of 1.2 x 10~(13)cm~(-2) is achieved in the Be_(0.03)Mg_(0.41)Zn_(0.56)O/ZnO heterostructure. For comparison, a 2DEG concentration of 7.7 x 10~(12)cm~(-2) requires 2% Be and 26% Mg in the barrier, whereas the same in the MgZnO/ZnO system would require incorporation of more than 40% Mg into the barrier, which necessitates very low growth temperatures. Our results are consistent with the demands on achieving short LO phonon lifetimes through plasmon-LO phonon resonance for high carrier velocity.
机译:研究了分子束外延在高电阻率GaN模板上通过分子束外延生长的Zn极性BeMgZnO / ZnO异质结构,该模板产生了高密度二维电子气(2DEG)。这是由于需要达到等离振子-纵向光学(LO)声子共振以获得最小的LO声子寿命而引起的。要在MgZnO / ZnO异质结构中实现高2DEG浓度,就需要在相对较低的温度下生长MgZnO势垒,这会损害三元质量,进而阻碍潜在的场效应晶体管性能。当该三元元素进一步与BeO合金化时,ZnO上BeMgZnO势垒中的应变符号从压缩变为拉伸,从而使压电极化和自发极化成为BeMgZnO / ZnO异质结构的加性,就像Ga极性AlGaN / GaN异质结构一样。结果,在Be_(0.03)Mg_(0.41)Zn_(0.56)O / ZnO异质结构中实现了1.2×10〜(13)cm〜(-2)的2DEG浓度。为了进行比较,2DEG浓度为7.7 x 10〜(12)cm〜(-2)时,势垒中需要2%的Be和26%的Mg,而在MgZnO / ZnO系统中,同样的情况下需要掺入40%以上的Mg进入屏障,这需要非常低的生长温度。我们的结果与通过等离振子-LO声子共振实现高LO声速以实现短LO声子寿命的要求是一致的。

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  • 来源
    《Applied Physics Letters》 |2017年第18期|182101.1-182101.5|共5页
  • 作者单位

    Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23284, USA;

    Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23284, USA;

    Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23284, USA;

    Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23284, USA;

    Department of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23284, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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