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Heavy and light hole minority carrier transport properties in low-doped n-InGaAs lattice matched to InP

机译:低掺杂n-InGaAs与InP匹配的重空穴和轻空穴少数载流子输运性质

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摘要

Minority carrier diffusion lengths in low-doped n-InGaAs using InP/InGaAs double-heterostructures are reported using a simple electrical technique. The contributions from heavy and light holes are also extracted using this methodology, including minority carrier mobilities and lifetimes. Heavy holes are shown to initially dominate the transport due to their higher valence band density of states, but at large diffusion distances, the light holes begin to dominate due to their larger diffusion length. It is found that heavy holes have a diffusion length of 54.5 ± 0.6 μm for an n-InGaAs doping of 8.4 × 10~(15) cm~(-3) at room temperature, whereas light holes have a diffusion length in excess of 140 μm. Heavy holes demonstrate a mobility of 692 ± 63 cm~2/Vs and a lifetime of 1.7 ± 0.2 μs, whereas light holes demonstrate a mobility of 6200 ± 960 cm~(-2)/Vs and a slightly longer lifetime of 2.6 ± 1.0 μs. The presented method, which is limited to low injection conditions, is capable of accurately resolving minority carrier transport properties.
机译:使用简单的电技术报告了使用InP / InGaAs双异质结构的低掺杂n-InGaAs中的少数载流子扩散长度。还使用此方法提取了重孔和轻孔的贡献,包括少数载流子迁移率和寿命。重空穴由于其较高的价带态密度而显示出最初占主导地位,但在较大的扩散距离处,轻空穴由于其较大的扩散长度而开始占主导地位。发现在室温下,对于8.4×10〜(15)cm〜(-3)的n-InGaAs掺杂,重空穴的扩散长度为54.5±0.6μm,而轻空穴的扩散长度超过140微米重孔的迁移率为692±63 cm〜2 / Vs,寿命为1.7±0.2μs,而轻孔的迁移率为6200±960 cm〜(-2)/ Vs,寿命稍长,为2.6±1.0微秒所提出的方法限于低注入条件,它能够准确地解决少数载流子传输特性。

著录项

  • 来源
    《Applied Physics Letters》 |2017年第16期|162107.1-162107.5|共5页
  • 作者单位

    National Research Council of Canada, 1200 Montreal Road, M-50, Ottawa, ON, Canada;

    National Research Council of Canada, 1200 Montreal Road, M-50, Ottawa, ON, Canada;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:20

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