机译:GaN-on-Si外延异质结构中存在掩埋的二维空穴气体(2DHG)的证据
Infineon Technologies Americas Corp, El Segundo, California 90245, USA;
Cambridge University, Cambridge CB30FA, United kingdom;
Cambridge University, Cambridge CB30FA, United kingdom;
Infineon Technologies Americas Corp, El Segundo, California 90245, USA;
Cambridge University, Cambridge CB30FA, United kingdom;
Cambridge University, Cambridge CB30FA, United kingdom;
Infineon Technologies Americas Corp, El Segundo, California 90245, USA;
Infineon Technologies Americas Corp, El Segundo, California 90245, USA;
Infineon Technologies Americas Corp, El Segundo, California 90245, USA;
机译:N极性GaN / Al_xGa_(1-x)/ GaN异质结构的理论研究:考虑到二维空穴和电子气的存在
机译:二维空穴气(2DHG)锗无结P-FinFET,通过通道中的调制掺杂实现无杂质扩散
机译:具有外延GaN-on-Si异质结构的温度依赖性晶格扩展,其特征在于和前原位X射线衍射
机译:P型GaN外延层和Aigan / GaN异质结构,具有高空穴浓度和HVPE生长的流动性
机译:GaN-On-Si异质结构损失和2deg作为导体的微波表征
机译:基于极化诱导的二维空穴气的P沟道InGaN / GaN异质结构金属氧化物半导体场效应晶体管
机译:GaN-on-Si外延异质结构中掩埋二维空气(2DHG)存在的实质