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Synthesis of second-order nonlinearities in dielectric-semiconductor-dielectric metamaterials

机译:电介质-半导体-电介质超材料中二阶非线性的合成

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摘要

We demonstrate a large effective second-order nonlinear optical susceptibility in electronic optical metamaterials based on sputtered dielectric-semiconductor-dielectric multilayers of silicon dioxide/amorphous silicon (a-Si)/aluminum oxide. The interfacial fixed charges (Q_f) with opposite signs on either side of dielectric-semiconductor interfaces result in a non-zero built-in electric field within the a-Si layer, which couples to the large third-order nonlinear susceptibility tensor of a-Si and induces an effective second-order nonlinear susceptibility tensor Ⅹ_(eff)~((2)). The value of the largest components of the effective Ⅹ_(eff)~((2)) tensor, i.e.,Ⅹ~((2))_(zzz), is determined experimentally to be 2 pm/V for the as-fabricated metamaterials and increases to 8.5 pm/V after the post-thermal annealing process. The constituents and fabrication methods make these metamaterials CMOS compatible, enabling efficient nonlinear devices for chip-scale silicon photonic integrated circuits.
机译:我们证明了基于二氧化硅/非晶硅(a-Si)/氧化铝的溅射介电-半导体-介电多层膜的电子光学超材料中的大型有效二阶非线性光学磁化率。在介电-半导体界面两侧带有相反符号的界面固定电荷(Q_f)导致a-Si层内的非零内置电场,该电场耦合到a-Si的大三阶非线性磁化率张量。 Si并感应出有效的二阶非线性磁化率张量Ⅹ_(eff)〜((2))。对于合成的超材料,通过实验确定有效(_(eff)〜((2))张量的最大分量的值即Ⅹ〜((2))_(zzz)为2 pm / V。并在后热退火过程后增加到8.5 pm / V。成分和制造方法使这些超材料与CMOS兼容,从而为芯片级硅光子集成电路提供了高效的非线性器件。

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  • 来源
    《Applied Physics Letters》 |2017年第11期|113103.1-113103.5|共5页
  • 作者单位

    Materials Science and Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA,Center for Memory and Recording Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0401, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA,Center for Memory and Recording Research, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093-0401, USA;

    Department of Electrical <6 Computer Engineering, University of California, San Diego, 9500 Gilman Drive, La Jolla, California 92093, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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