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Decoupling interface effect on the phase stability of CdS thin films by van der Waals heteroepitaxy

机译:范德华异质外延解耦界面对CdS薄膜相稳定性的影响

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摘要

Wurtzite (W) and zinc-blende (ZB) polytypism has long been observed in epitaxial CdS thin films. The present work, based on van der Waals epitaxial CdS thin films, is an attempt to explain which crystal modification, W or ZB, is favored under different growth conditions. In this van der Waals epitaxy system where the substrate influence is considered weak, it is found that the substrate temperature plays a crucial role in determining the crystal modification of CdS, that is, W and ZB CdS are more stable at low and high ends of substrate temperature, respectively. We attribute this temperature effect to the entropy difference (S_W < S_(zb)), a conclusion well supported by the thermody-namic hard sphere model formulation of the entropy difference between hexagonal close-packed and face-centered cubic structures. By summarizing other works, we find that the entropy difference model can also be applied to large mismatched (approx>3%) CdS-substrate chemical epitaxy systems but not for small mismatched (approx<3%) ones. In the latter case, the energy benefit in terms of high density of bonding contributed by the substrate-film interface is believed to be too overwhelming for the intrinsic entropy difference to overcome. Furthermore, the deposition rate is found to affect the crystalline quality and strain level in CdS films but not the crystal modification of the CdS films. Last, Raman and photoluminescence spectroscopies reveal the strain behaviors in the films. The phase change from W to ZB CdS is well-correlated with the observed peak shifts in Raman and photoluminescence spectroscopies.
机译:长期以来,在外延CdS薄膜中观察到纤锌矿(W)和共混锌(ZB)的类型。基于Van der Waals外延CdS薄膜的当前工作是试图解释在不同的生长条件下偏爱哪种晶体修饰W或ZB。在这种范德华斯外延系统中,对衬底的影响被认为是微弱的,发现衬底温度在决定CdS的晶体修饰方面起着至关重要的作用,即W和ZB CdS在CdS的低端和高端更稳定。底物温度。我们将此温度效应归因于熵差(S_W

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  • 来源
    《Applied Physics Letters》 |2017年第4期|041602.1-041602.5|共5页
  • 作者单位

    Department of Physics, Applied Physics and Astronomy, and Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York, 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy, and Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York, 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180, USA;

    Department of Physics, Applied Physics and Astronomy, and Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York, 12180, USA;

    Department of Physics, Applied Physics and Astronomy, and Center for Materials, Devices and Integrated Systems, Rensselaer Polytechnic Institute, Troy, New York, 12180, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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