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首页> 外文期刊> >Dependence of Magnetic Anisotropy in Co_(20)Fe_(60)B_(20) Free Layers on Capping Layers in MgO-Based Magnetic Tunnel Junctions with In-Plane Easy Axis
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Dependence of Magnetic Anisotropy in Co_(20)Fe_(60)B_(20) Free Layers on Capping Layers in MgO-Based Magnetic Tunnel Junctions with In-Plane Easy Axis

机译:平面内易轴基于MgO的磁性隧道结中封盖层上Co_(20)Fe_(60)B_(20)自由层中磁各向异性的依赖性

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摘要

Perpendicular magnetic anisotropy (PMA) in Co_(20)Fe_(60)B_(20) films depending on the adjacent layers of Ta, Ru, and MgO was studied for reduction of switching current density J_(20) in in-plane magnetic tunnel junctions (MTJs). A MgO layer reduces the out-of-plane saturation field (H_s) of in-plane easy axis Co_(20)Fe_(60)B_(20) films by inducing a strong PMA at the Co_(20)Fe_(60)B2o/MgO interface. The PMA is not affected much by the crystallinity in Co_(20)Fe_(60)B_(20) films with different capping layers. MTJ with a MgO capping layer shows a lower J∞ than that with a Ru capping layer, in accordance with the reduction of H_s.
机译:研究了取决于Ta,Ru和MgO相邻层的Co_(20)Fe_(60)B_(20)膜中的垂直磁各向异性(PMA),以降低平面磁隧道中的开关电流密度J_(20)路口(MTJ)。 MgO层通过在Co_(20)Fe_(60)B2o处诱导强大的PMA来减小平面内易轴Co_(20)Fe_(60)B_(20)膜的面外饱和场(H_s) / MgO接口。 PMA受具有不同覆盖层的Co_(20)Fe_(60)B_(20)薄膜的结晶度影响不大。根据H_s的减少,具有MgO覆盖层的MTJ的J∞比具有Ru覆盖层的MTJ低。

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  • 来源
    《》 |2012年第5期|p.053002.1-053002.3|共3页
  • 作者单位

    Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan;

    Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan;

    Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan,Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan,Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan;

    Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185-8601, Japan;

    Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan,Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

    Center for Spintronics Integrated Systems, Tohoku University, Sendai 980-8577, Japan,Laboratory for Nanoelectronics and Spintronics, Research Institute of Electrical Communication, Tohoku University, Sendai 980-8577, Japan;

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