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首页> 外文期刊>Applied physics express >Resistance switching memory characteristics of CaF2/Si/CaF2 resonant-tunneling quantum-well heterostructures sandwiched by nanocrystalline Si secondary barrier layers
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Resistance switching memory characteristics of CaF2/Si/CaF2 resonant-tunneling quantum-well heterostructures sandwiched by nanocrystalline Si secondary barrier layers

机译:CaF2 / Si / CaF2共振隧道量子阱异质结构夹在纳米晶Si次级势垒层之间的电阻切换存储特性

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摘要

A novel resistance switching memory using CaF2/Si/CaF2 resonant-tunneling quantum well heterostructures sandwiched by nanocrystalline Si (nc-Si) as secondary barrier layers has been proposed and the room temperature current-voltage characteristics of the basic resistance switching memory operation have been demonstrated. A resistance switching voltage of 1.0V, a peak current density of approximately 42 kA/cm(2), and an ON/OFF ratio of 2.8 were observed. In particular, more than 28000 write-read-erase cyclic memory operations have been demonstrated by applying pulsed input voltage sequences, which suggests better endurance than the device using a CaF2/CdF2/CaF2 heterostructure. (C) 2016 The Japan Society of Applied Physics
机译:提出了一种使用CaF2 / Si / CaF2共振隧道量子阱异质结构夹在中间的纳米晶硅(nc-Si)作为次级势垒层的新型电阻开关存储器,并且已经实现了基本电阻开关存储器操作的室温电流-电压特性。演示。观察到1.0V的电阻开关电压,大约42 kA / cm(2)的峰值电流密度和2.8的ON / OFF比。特别是,通过施加脉冲输入电压序列已证明了28000次以上的写-读-擦除循环存储器操作,这表明其耐用性比使用CaF2 / CdF2 / CaF2异质结构的器件更好。 (C)2016年日本应用物理学会

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  • 来源
    《Applied physics express》 |2016年第7期|074001.1-074001.4|共4页
  • 作者单位

    Tokyo Inst Technol, Interdisciplinary Grad Sch & Engn, Dept Elect & Appl Phys, Yokohama, Kanagawa 2268502, Japan;

    Tokyo Inst Technol, Interdisciplinary Grad Sch & Engn, Dept Elect & Appl Phys, Yokohama, Kanagawa 2268502, Japan;

    Tokyo Inst Technol, Sch Engn, Dept Elect & Elect Engn, Yokohama, Kanagawa 2268502, Japan;

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