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Decision of Error Tolerance in Array Element by the Monte Carlo Method

机译:蒙特卡罗方法确定数组元素的容错性

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摘要

In this paper, the tolerance of errors in each array element that is required to satisfy the tolerance of beam pattern is decided by the Monte Carlo (MC) method. To examine the pass or fail of element errors to the desired beam pattern, instead of exploring the whole M-segmented element error as is usually done in deterministic methods, MC tests only for randomly selected errors and greatly reduce the computational costs with the desired numerical accuracy. The different effect of each element error on the resultant beam pattern is considered by calculating the variance of error for each element, the tolerance of an element is decided when 95% of N samples meet the acceptable beam pattern. To verify the proposed technique, the tolerance of each element in two-dimensional planar array is determined.
机译:在本文中,通过蒙特卡洛(MC)方法确定满足光束方向图公差所需的每个阵列元素的误差公差。为了检查元素错误通过或失败到所需光束方向图的过程,而不是像确定性方法那样通常探索整个M分段元素错误,MC仅测试随机选择的错误,并以所需数值大大降低了计算成本准确性。通过计算每个元素的误差方差,可以考虑每个元素误差对最终波束方向图的不同影响,当N个样本中有95%满足可接受的波束方向图时,可以确定元素的容差。为了验证所提出的技术,确定了二维平面阵列中每个元素的公差。

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