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Experimental Characterization of a Pulsed Plasma Jet

机译:脉冲等离子体射流的实验表征

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摘要

The characteristics of a pulsed plasmajet exhausting into quiescent air under a single-pulse operation are presented. A HV trigger of approximately 3.6 kV was used to ionize the air gap between an anode and a cathode. The subsequent electric arc discharge deposits energy from a capacitor charged to a voltage near 570 V. Three capacitor sizes were examined: 0.25, 2, and 25 μF with calculated energy additions of 41 mJ, 330 mJ, and 4.0 J, respectively. Schlieren images and particle image velocimetry measurements revealed that the jet structure, local velocity, penetration depth, and exhaust duration are strongly dependent on capacitance, and thus energy deposition. Peak velocities were measured to be 130, 320, and 496 m/s for the three capacitances tested. A pulsating jet behavior was observed for each capacitor case and is reasoned to be the result of cavity wave dynamics. Modifications to the actuator geometry, including the cavity volume and orifice diameter, and the capacitor-charging power supply are necessary for high-frequency activation required for many flow-control applications. However, owing to the ability to produce coherent ring vortices and significant jet velocities far from the orifice exit, the pulsed plasmjet actuator shows promise as an active flow-control device for influencing and controlling supersonic flows.
机译:提出了在单脉冲操作下排放到静态空气中的脉冲等离子流的特性。大约3.6 kV的HV触发器用于电离阳极和阴极之间的气隙。随后的电弧放电从充电至570 V电压的电容器中沉积能量。检查了三种电容器尺寸:0.25、2和25μF,计算出的能量相加分别为41 mJ,330 mJ和4.0J。 Schlieren图像和粒子图像测速仪测量结果表明,射流的结构,局部速度,穿透深度和排气持续时间强烈依赖于电容,因此也取决于能量沉积。测试的三个电容的峰值速度分别为130、320和496 m / s。在每个电容器壳体中都观察到脉动喷射行为,并且被认为是腔波动力学的结果。致动器几何形状的修改(包括腔体体积和孔口直径)以及电容器充电电源对于许多流量控制应用所需的高频激活而言是必需的。然而,由于能够产生相干的环形涡流和远离孔口的显着射流速度,脉冲等离子射流致动器显示出作为影响和控制超声速流动的主动流量控制装置的希望。

著录项

  • 来源
    《AIAA Journal》 |2013年第8期|2027-2031|共5页
  • 作者单位

    Aerospace Engineering, University of Illinois at Urbana-Champaign,Urbana, Illinois 61801;

    Aerospace Engineering, University of Illinois at Urbana-Champaign,Urbana, Illinois 61801;

    Aerospace Engineering, University of Illinois at Urbana-Champaign,Urbana, Illinois 61801;

    Aerospace Engineering, University of Illinois at Urbana-Champaign,Urbana, Illinois 61801;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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