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High Spatial Resolution Time-of-Flight Secondary Ion Mass Spectrometry for the Masses: A Novel Orthogonal ToF FIB-SIMS Instrument with In Situ AFM

机译:大众的高空间分辨率飞行时间二次离子质谱法:一种新型的具有原位原子力显微镜的正交ToF FIB-SIMS仪器

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摘要

We describe the design and performance of an orthogonal time-of-flight (TOF) secondary ion mass spectrometer that can be retrofitted to existing focused ion beam (FIB) instruments. In particular, a simple interface has been developed for FIB/SEM instruments from the manufacturer Tescan. Orthogonal extraction to the mass analyser obviates the need to pulse the primary ion beam and does not require the use of monoisotopic gallium to preserve mass resolution. The high-duty cycle and reasonable collection efficiency of the new instrument combined with the high spatial resolution of a gallium liquid metal ion source allow chemical observation of features smaller than 50 nm. We have also demonstrated the integration of a scanning probe microscope (SPM) operated as an atomic force microscope (AFM) within the FIB/SEM-SIMS chamber. This provides roughness information, and will also allow true three dimensional chemical images to be reconstructed from SIMS measurements.
机译:我们描述了正交飞行时间(TOF)二次离子质谱仪的设计和性能,该质谱仪可以改装为现有的聚焦离子束(FIB)仪器。特别是,制造商Tescan为FIB / SEM仪器开发了一个简单的界面。质谱仪的正交萃取消除了对主离子束脉冲化的需要,并且不需要使用单同位素镓来保持质量分辨率。新仪器的高占空比和合理的收集效率,再加上镓液态金属离子源的高空间分辨率,可以对小于50 nm的特征进行化学观察。我们还展示了在FIB / SEM-SIMS腔室内作为原子力显微镜(AFM)使用的扫描探针显微镜(SPM)的集成。这提供了粗糙度信息,还将允许从SIMS测量中重建真实的三维化学图像。

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  • 来源
    《Advances in materials science and engineering》 |2012年第1期|p.180437.1-180437.13|共13页
  • 作者单位

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland,TOFWERK AG, Uttigenstrasse 22, 3600 Thun, Switzerland;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland,Idaho National Laboratory, Idaho Falls, ID 83415, USA;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland;

    TOFWERK AG, Uttigenstrasse 22, 3600 Thun, Switzerland;

    Tescan a. s., Libulina tfida 21, 623 00 Brno, Czech Republic;

    Tescan a. s., Libulina tfida 21, 623 00 Brno, Czech Republic;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland,Specs Zuerich GmbH, Technoparkstrasse 1, 8005 Zuerich, Switzerland;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland,Institut Europeen des Membranes (UR CNRS 5635), Universite Montpellier 2, Place Eugene Bataillon, 34095 Montpellier, France;

    EMPA, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland;

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