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Bandgap Tuned WS_2 Thin-Film Photodetector by Strain Gradient in van der Waals Effective Homojunctions

机译:带隙调谐WS_2薄膜光电探测器通过van der Waals的应变梯度有效同性全调

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摘要

Van der Waals (vdW) heterostructures (or heterojunctions) are formed by stacking two different 2D materials (e.g., graphene, h-BN, or transition metal dichalcogenides) across vdW gaps. In a type-II heterojunction, 2D semiconductors are aligned with staggered bandgaps, which can effectively separate electron and hole carriers, and enable promising high-performance photovoltaics and photodetectors. Herein, an effective vdW-homojunction is reported, formed by one 2D material (2H-WS2) with vdW gap engineering leading to different electronic structures and type-II junction formation. WS2 films are synthesized by W metal deposition and controlled sulfurization method leading to a nonuniform vdW gap strain in the film. The vdW strain gradients in multilayer WS2 films are confirmed by transmission electron microscopy analysis, and the modeling by density functional theory shows an effective type-II homojunction formation via modulated bandgaps by the vdW gap strains. The superior performance of a broadband photodetector application is confirmed by photoluminescence and photocurrent experiments.
机译:通过在VDW间隙上堆叠两种不同的2D材料(例如,石墨烯,H-BN或过渡金属二甲基甲基甲基甲基甲基甲基化物来形成VAN DAR WAALS(VDW)异质结构(或异质函数)。在II型异质结中,2D半导体与交错带隙对齐,这可以有效地分离电子和空穴载体,并实现高性能的光伏和光电探测器。这里,报告了一种有效的VDW-MODON结,其由一个具有VDW间隙工程的一个2D材料(2H-WS2)形成,导致不同的电子结构和II型结形成。通过W金属沉积和受控的硫化方法合成WS2薄膜,导致薄膜中的非均匀VDW间隙应变。通过透射电子显微镜分析证实了多层WS2膜中的VDW应变梯度,并且通过密度函数理论的建模显示了通过VDW间隙菌株调制的带隙的有效类型-II同质形成。通过光致发光和光电流实验证实了宽带光电探测器应用的优异性能。

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  • 来源
    《Advanced Optical Materials》 |2021年第22期|2101310.1-2101310.10|共10页
  • 作者单位

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea;

    Univ Texas Dallas Dept Mat Sci & Engn Richardson TX 75080 USA;

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea;

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea;

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea|Univ Sci & Technol UST Sch ETRI ICT Adv Device Technol Daejeon 34113 South Korea;

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea|Univ Sci & Technol UST Sch ETRI ICT Adv Device Technol Daejeon 34113 South Korea;

    Univ Texas Dallas Dept Mat Sci & Engn Richardson TX 75080 USA|Chonnam Natl Univ Dept Phys Educ Gwangju 61186 South Korea;

    Elect & Telecommun Res Inst ETRI ICT Creat Res Lab Daejeon 34129 South Korea;

    Univ Texas Dallas Dept Mat Sci & Engn Richardson TX 75080 USA;

    Elect & Telecommun Res Inst ETRI Graphene Res Team ICT Creat Res Lab Daejeon 34129 South Korea|Univ Sci & Technol UST Sch ETRI ICT Adv Device Technol Daejeon 34113 South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    optoelectronic devices; photodetectors; strain-induced bandgap tuning; transition-metal dichalcogenides; tungsten disulfide;

    机译:光电器件;光电探测器;应变诱导的带隙调谐;过渡金属二硫代甲基化物;钨二硫化物;

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