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Seamless MoTe2 Homojunction PIN Diode toward 1300 nm Short-Wave Infrared Detection

机译:面向1300 nm短波红外检测的无缝MoTe2同质结PIN二极管

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Homojunction PN and PIN diodes based on 2D transition metal dichalcogenide (TMD) MoTe2 are reported in this work. Up to date, for PN junction diodes, type II-based heterojunction diodes are mainly seen in report, but homojunction PN diodes using 2D-layered materials are still rare although they enable seamless integration. Recently, hydrogen (H)-doped n-type MoTe2, achieved via atomic layer deposition (ALD) on top of a p-type MoTe2 surface, was reported. Consequently, a lateral homojunction PN diode was realized by H-doping. In fact, MoTe2-based devices with a thickness on the order of nanometers can be applied for short-wave infrared (SWIR) detection in the range of approximate to 1300 nm, a wavelength that Si-based devices cannot properly address. Here, a seamless MoTe2 homojunction PIN diode is demonstrated, achieving the detection of visible to 1300 nm SWIR photons. This thin MoTe2 initially forms a PN junction by selective H-doping, but a PIN diode is even obtained using two split gates. Compared to the PN diode mode, the PIN mode greatly enhances the photoresponse in the visible to 1300 nm wavelength range because of the increased built-in electric field. The Franz-Keldysh effect is regarded strongly responsible for the effective absorption of 1300 nm SWIR photons in MoTe2. It is anticipated that this development may support Si photodetectors for integration on Si devices.
机译:这项工作报道了基于2D过渡金属二卤化金属(TMD)MoTe2的同质结PN和PIN二极管。迄今为止,对于PN结二极管,基于II型异质结二极管的报道最为普遍,但是使用2D层材料的同质结PN二极管虽然能够实现无缝集成,但仍然很少见。近来,报道了通过在p型MoTe 2表面的顶部上的原子层沉积(ALD)而实现的氢(H)掺杂的n型MoTe 2。因此,通过H掺杂实现了横向同质结PN二极管。实际上,可以将厚度约为纳米的基于MoTe2的器件用于短波红外(SWIR)检测,其波长范围约为1300 nm,这是基于Si的器件无法正确解决的波长。在这里,展示了一个无缝的MoTe2同质结PIN二极管,实现了对1300 nm SWIR光子可见的检测。这种薄的MoTe2最初通过选择性的H掺杂形成PN结,但是甚至可以使用两个分离的栅极获得PIN二极管。与PN二极管模式相比,由于内置电场的增加,PIN模式大大增强了可见光到1300 nm波长范围内的光响应。 Franz-Keldysh效应被认为是MoTe2中1300 nm SWIR光子有效吸收的重要原因。可以预期,该开发可以支持用于Si器件上集成的Si光电探测器。

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