Nanopatterned Self-Assembled Monolayers by Using Diblock Copolymer Micelles as Nanometer-Scale Adsorption and Etch Masks

摘要

Nanometer-scale patterning of surfaces is a highly relevant and interesting topic of research today, owing to its potential contributions to device miniaturization and creation of novel functional interfaces with applications ranging from electronics to biomedicine. Several methods of nanopatterning are known, for example, nanoimprint lithography,laser interferome-try, extreme ultraviolet interference lithography, shadow mask lithography, and scanning-probe-microscopy-based lithographic methods. Although the topographical and chemical structuring of surfaces by using one or more of these techniques is well-established and is state-of-the-art, these methods also suffer from some drawbacks.