Cubic Silsesquioxanes as a Green, High-Performance Mold Material for Nanoimprint Lithography

摘要

Optical lithography deep in the UV spectrum is the predominate route for high-resolution, high-volume nanoscale pattering. However, state-of-the-art optical lithography tools are exceedingly expensive and this places serious limitations on the applications, technical sectors, and markets where high-resolution patterning can be implemented. To date the only substantial market for high-end optical lithography tools has been semiconductor fabrication. Nanoimprint lithography (NIL) has recently emerged as an alternative to optical lithography and combines the potential of sub-five-nanometer patterning resolution with the low cost and simplicity of a stamping process.