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Giant Optical Gain in a Rare-Earth-Ion-Doped Microstructure

机译:稀土离子掺杂微结构的巨大光学增益

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摘要

Semiconductor optical waveguide amplifiers deliver high gain per unit length (up to -1000 dBcm-1),' enabling light amplification over short distances in photonic integrated circuits.' contrast, rare-earth ions are regarded as impurities providing low gain (up to -10 dBcm-1),because electronic transitions within their 4/subshell are parity forbidden, dictating low transition probabilities and cross-sections. Nevertheless, devices such as fiber amplifiers and solid-state lasers profit from accordingly long excited-state lifetimes-hence increased excitation densities-in rare-earth-ion-doped materials, combined with large device lengths. Here we exploit the extreme inversion densities attainable in rare-earth-ion-doped microstructures in a host material, potassium double tungstate,that provides enhanced transition cross-sections and dopant concentrations,'thereby demonstrating a gain of 935 dBcm-1 in channel-waveguide and 1028 dBcm-1 thin-film geometry, comparable to the best values reported for semiconductor waveguide amplifiers. Further improvement seems feasible with larger dopant concentrations. This gain is sufficient to compensate propagation losses in plasmonic nanostructures, making specific rare-earth-ion-doped materials highly interesting for future nanophotonic devices.
机译:半导体光波导放大器在每单位长度上提供高增益(高达-1000 dBcm-1),从而实现了光子集成电路中短距离的光放大。相比之下,稀土离子被视为提供低增益(高达-10 dBcm-1)的杂质,因为禁止在其4 /子壳内进行电子跃迁奇偶校验,从而规定了低跃迁几率和横截面。然而,诸如光纤放大器和固态激光器之类的设备受益于相应的长激发态寿命,从而在掺杂稀土离子的材料中增加了激发密度,同时又增加了器件的长度。在这里,我们利用在主体材料双钨酸钾中掺入稀土离子的微结构所能达到的极高反转密度,从而提供了增强的过渡截面和掺杂剂浓度,从而证明了在沟道中的增益为935 dBcm-1。波导和1028 dBcm-1的薄膜几何形状,可与半导体波导放大器报告的最佳值相媲美。更大的掺杂剂浓度似乎可以进一步改善。该增益足以补偿等离子体纳米结构中的传播损耗,从而使得特定的掺有稀土离子的材料对于未来的纳米光子器件非常感兴趣。

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  • 来源
    《Advanced Materials》 |2012年第10期|p.OP19-OP22|共4页
  • 作者单位

    Integrated Optical Micro Systems Group MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, Enschede, 7500 AE, The Netherlands;

    Integrated Optical Micro Systems Group MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, Enschede, 7500 AE, The Netherlands;

    Integrated Optical Micro Systems Group MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, Enschede, 7500 AE, The Netherlands;

    Integrated Optical Micro Systems Group MESA+ Institute for Nanotechnology University of Twente P.O. Box 217, Enschede, 7500 AE, The Netherlands;

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