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SnSe/MoS_2 van der Waals Heterostructure Junction Field-Effect Transistors with Nearly Ideal Subthreshold Slope

机译:SnSe / MoS_2 van der Waals具有接近理想亚阈值斜率的异质结结场效应晶体管

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摘要

The minimization of the subthreshold swing (SS) in transistors is essential for low-voltage operation and lower power consumption, both critical for mobile devices and internet of things (IoT) devices. The conventional metal-oxide-semiconductor field-effect transistor requires sophisticated dielectric engineering to achieve nearly ideal SS (60 mV dec(-1) at room temperature). However, another type of transistor, the junction field-effect transistor (JFET) is free of dielectric layer and can reach the theoretical SS limit without complicated dielectric engineering. The construction of a 2D SnSe/MoS2 van der Waals (vdW) heterostructure-based JFET with nearly ideal SS is reported. It is shown that the SnSe/MoS2 vdW heterostructure exhibits excellent p-n diode rectifying characteristics with low saturate current. Using the SnSe as the gate and MoS2 as the channel, the SnSe/MoS2 vdW heterostructure exhibit well-behavioured n-channel JFET characteristics with a small pinch-off voltage V-P of -0.25 V, nearly ideal subthreshold swing SS of 60.3 mV dec(-1) and high ON/OFF ratio over 10(6), demonstrating excellent electronic performance especially in the subthreshold regime.
机译:晶体管的亚阈值摆幅(SS)的最小化对于低压操作和更低的功耗至关重要,这对于移动设备和物联网(IoT)设备都是至关重要的。常规的金属氧化物半导体场效应晶体管需要复杂的介电工程以实现接近理想的SS(室温下为60 mV dec(-1))。但是,另一种晶体管,结型场效应晶体管(JFET)没有介电层,并且可以在不进行复杂介电工程的情况下达到理论SS极限。据报道,具有几乎理想的SS的基于二维SnSe / MoS2 van der Waals(vdW)异质结构的JFET的构建。结果表明,SnSe / MoS2 vdW异质结构在低饱和电流的情况下表现出出色的p-n二极管整流特性。使用SnSe作为栅极和MoS2作为沟道,SnSe / MoS2 vdW异质结构表现出良好的n沟道JFET特性,夹断电压VP为-0.25 V,接近理想的亚阈值摆幅SS为60.3 mV dec( -1)和超过10(6)的高开/关比,尤其在亚阈值范围内表现出出色的电子性能。

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