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Rewritable Holographic Structures Formed in Organic- Inorganic Hybrid Materials by Photothermal Processing

机译:通过光热处理在有机-无机杂化材料中形成可重写全息结构

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摘要

Holographic and direct-written structures are fabricated in tin-doped silicophosphite thin plates containing rhodamine 6G dye by a photothermal process based on the principle of glass softening/frozen-in behavior. To be highly processable by photothermal treatment and stable at room temperature after processing, the intrinsic viscoelastic property is improved by increasing the crosslinking density of the network structure, and the photothermal conditions for efficient transfer of the irradiated photons to thermal phonons are explored. Then, the excellent rewritability and reliability of the fine processed structure are found by examining the writing/erasing repetition. Furthermore, the origins of the changes in refractive index due to photothermal treatment are classified into density change and photobleaching, and the dynamics of the formation process of holographic gratings are studied by measuring refractive index changes as functions of irradiation time and wavelength. As a result, it is found that the holographic structure consists of spatial modulation of the refractive index and the refractive index change results primarily from the change in the frozen structure, although there is a slight influence by photobleaching.
机译:基于玻璃软化/冻结行为的原理,通过光热法在包含若丹明6G染料的锡掺杂硅亚磷酸酯薄板上制造了全息结构和直写结构。为了通过光热处理可高度加工并在加工后在室温下稳定,通过增加网络结构的交联密度来改善固有的粘弹性,并探索了将辐照的光子有效转移至热声子的光热条件。然后,通过检查写入/擦除重复来发现精细加工的结构的优异的可重写性和可靠性。此外,将由于光热处理引​​起的折射率变化的起源分为密度变化和光漂白,并且通过测量折射率变化作为照射时间和波长的函数来研究全息光栅的形成过程的动力学。结果,发现全息结构由折射率的空间调制组成,并且折射率变化主要是由冷冻结构的变化引起的,尽管受到光漂白的影响很小。

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  • 来源
    《Advanced Functional Materials 》 |2009年第16期| 2569-2576| 共8页
  • 作者单位

    Materials Research Institute for Sustainable Development National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora, Shimoshidami, Moriyama, Nagoya 463-8560 (Japan);

    Institute for Chemical Research Kyoto University Uji, Kyoto, 611-0011 (Japan);

    Institute for Chemical Research Kyoto University Uji, Kyoto, 611-0011 (Japan);

    Institute for Chemical Research Kyoto University Uji, Kyoto, 611-0011 (Japan);

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