...
首页> 外文期刊>Advanced Functional Materials >Very Low Degree of Energetic Disorder as the Origin of High Mobility in an n-channel Polymer Semiconductor
【24h】

Very Low Degree of Energetic Disorder as the Origin of High Mobility in an n-channel Polymer Semiconductor

机译:低能级失能是n通道聚合物半导体中高迁移率的起源

获取原文
获取原文并翻译 | 示例

摘要

Charge transport is investigated in high-mobility n-channel organic field-effect transistors (OFETs) based on poly{[N,N'-bis(2-octyldodecyl)-naphthalene-l,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,5'-(2,2'-bithiophene)}(P(NDI2OD-T2), Polyera Activlnk~™ N2200) with variable-temperature electrical measurements and charge-modulation spectroscopy. Results indicate an unusually uniform energetic landscape of sites for charge-carrier transport along the channel of the transistor as the main reason for the observed high-electron mobility. Consistent with a lateral field-independent transport at temperatures down to 10 K, the reorganization energy is proposed to play an important role in determining the activation energy for the mobility. Quantum chemical calculations, which show an efficient electronic coupling between adjacent units and a reorganization energy of a few hundred meV, are consistent with these findings.
机译:在基于聚{[N,N'-双(2-辛基十二烷基)-萘-1,4,5,8-双(二​​甲叉酰亚胺)的高迁移率n沟道有机场效应晶体管(OFET)中研究了电荷传输-2,6-二基] -alt-5,5'-(2,2'-联噻吩)}(P(NDI2OD-T2),Polyera Activlnk™N2200),具有可变温度电测量和电荷调制光谱。结果表明,沿着晶体管的沟道电荷载流子传输的位点的能量分布异常均匀,这是观察到的高电子迁移率的主要原因。与在低至10 K的温度下与横向场无关的传输一致,提议重组能量在确定迁移率的活化能中起重要作用。量子化学计算显示出相邻单元之间的有效电子耦合以及数百meV的重组能,与这些发现相符。

著录项

  • 来源
    《Advanced Functional Materials 》 |2011年第17期| p.3371-3381| 共11页
  • 作者单位

    Cavendish Laboratory J. J. Thomson Avenue, Cambridge CB3 OHE, UK,Center for Nano Science and Technology @ PoliMi Istituto Italiano di Tecnologia Via Pascoli 70/3, 20133 Milano, Italy;

    Cavendish Laboratory J. J. Thomson Avenue, Cambridge CB3 OHE, UK;

    Center for Nano Science and Technology @ PoliMi Istituto Italiano di Tecnologia Via Pascoli 70/3, 20133 Milano, Italy;

    Polyera Corporation 8045 Lamon Avenue, Skokie, Illinois 60077, USA;

    Cavendish Laboratory J. J. Thomson Avenue, Cambridge CB3 OHE, UK;

    Polyera Corporation 8045 Lamon Avenue, Skokie, Illinois 60077, USA;

    Polyera Corporation 8045 Lamon Avenue, Skokie, Illinois 60077, USA;

    Cavendish Laboratory J. J. Thomson Avenue, Cambridge CB3 OHE, UK;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号