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Low-Noise Multispectral Photodetectors Made from All Solution-Processed Inorganic Semiconductors

机译:由所有溶液处理的无机半导体制成的低噪声多光谱光电探测器

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摘要

Infrared, visible, and multispectral photodetectors are important components for sensing, security and electronics applications. Current fabrication of these devices is based on inorganic materials grown by epitaxial techniques which are not compatible with low-cost large-scale processing. Here, air-stable multispectral solution-processed inorganic double heterostructure photodetectors, using PbS quantum dots (QDs) as the photoactive layer, colloidal ZnO nanoparticles as the electron transport/hole blocking layer (ETL/HBL), and solution-derived NiO as the hole transport/electron blocking layer (HTL/EBL) are reported. The resulting device has low dark current density of 20 nA cm~(-2) with a noise equivalent power (NEP) on the order of tens of picowatts across the detection spectra and a specific detectivity (D*) value of 1.2 × 10~(12) cm Hz~(1/2) W~(-1). These parameters are comparable to commercially available Si, Ge, and InCaAs photodetectors. The devices have a linear dynamic range (LDR) over 65 dB and a bandwidth over 35 kHz, which are sufficient for imaging applications. Finally, these solution-processed inorganic devices have a long storage lifetime in air, even without encapsulation.
机译:红外,可见光和多光谱光电探测器是传感,安全和电子应用的重要组件。这些设备的当前制造基于通过外延技术生长的无机材料,该无机材料与低成本大规模加工不兼容。在此,采用PbS量子点(QDs)作为光敏层,胶体ZnO纳米颗粒作为电子传输/空穴阻挡层(ETL / HBL)和溶液衍生的NiO作为空气稳定的多光谱溶液处理的无机双异质结构光电探测器。报道了空穴传输/电子阻挡层(HTL / EBL)。所得器件的暗电流密度低至20 nA cm〜(-2),在整个检测光谱上的噪声等效功率(NEP)约为数十皮瓦,比检测度(D *)值为1.2×10〜 (12)厘米Hz〜(1/2)W〜(-1)。这些参数与市售的Si,Ge和InCaAs光电探测器相当。这些器件具有超过65 dB的线性动态范围(LDR)和超过35 kHz的带宽,足以满足成像应用的需求。最后,这些溶液处理的无机器件即使在没有封装的情况下,在空气中的存储寿命也很长。

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  • 来源
    《Advanced Functional Materials》 |2014年第45期|7205-7210|共6页
  • 作者单位

    Department of Materials Science and Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Materials Science and Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Electrical and Computer Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Electrical and Computer Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Materials Science and Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Materials Science and Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Electrical and Computer Engineering University of Florida Gainesville, FL 32611, USA;

    Department of Materials Science and Engineering University of Florida Gainesville, FL 32611, USA;

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