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首页> 外文期刊>Advanced Functional Materials >Newly Synthesized Nonvacuum Processed High-k Polymeric Dielectrics with Carboxyl Functionality for Highly Stable Operating Printed Transistor Applications
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Newly Synthesized Nonvacuum Processed High-k Polymeric Dielectrics with Carboxyl Functionality for Highly Stable Operating Printed Transistor Applications

机译:新合成的非撤分加工高k聚合物电介质,具有羧基功能,用于高稳定的操作印刷晶体管应用

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摘要

Solution-processed polar hydroxyl containing polymers such as poly(4-vinylphenol) are widely utilized in organic filed-effect transistors (OFETs) due to their high dielectric constant (k) and excellent insulating properties owing to the crosslinking through their hydroxyl groups. However, hydroxyl functionalities can function as trapsites, and their crosslinking reactions decrease the k value of materials. Hence, in this study, new solution-processable copolymers containing both carboxyl and hydrophobic functionalities are synthesized. A fluorophenyl azide (FPA) based UV-assisted crosslinker is also employed to promote the movement of polar carboxyl groups toward the bulk region and the hydrophobic functionalities to the surface region, thereby maintaining the high-k characteristics and hydrophobic surface in thin film. Thus, the addition of an FPA crosslinker eliminates the trapsites on the surface, allowing a stable operation and efficient charge transport. Additionally, the solution-processability enables the production of uniform and thin films to yield OFETs with stable and low-voltage driving characteristics. The printed layers are also applied as gate dielectrics for floating gate memory devices and in integrated one-transistor-one-transistor based memory cells, displaying their excellent memory performance. The synthesis and fabrication strategies employed in this study can become useful guidelines for the production of high-k dielectrics for stable OFETs and other applications.
机译:由于它们的高介电常数(k)和通过其羟基交联而在有机型效应晶体管(OFET)中,在有机型效应晶体管(OFET)中广泛用于溶液处理的极性羟丙基聚合物。然而,羟基官能团可以用作矿物,并且它们的交联反应降低了材料的k值。因此,在该研究中,合成了含有羧基和疏水性官能团的新的解决方案可加工共聚物。还采用含氟氧化氟(FPA)的UV辅助交联剂,以促进极性羧基朝向体积和疏水性官能团的运动,从而保持薄膜中的高k特性和疏水表面。因此,添加FPA交联剂的添加消除了表面上的捕发物,允许稳定的操​​作和有效的电荷传输。另外,溶液加工性使得能够生产均匀和薄膜,以产生具有稳定和低压驱动特性的缩短。印刷层也应用于栅极电介质,用于浮动栅极存储器装置和基于集成的一晶体管一晶体管的存储器单元,显示它们的优异内存性能。本研究所采用的合成和制造策略可以成为生产高k电介质的有用指导,用于稳定的OFETS和其他应用。

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  • 来源
    《Advanced Functional Materials 》 |2021年第5期| 2007304.1-2007304.17| 共17页
  • 作者单位

    Pohang Univ Sci & Technol Dept Chem Engn Pohang 37673 South Korea;

    Yeungnam Univ Sch Chem Engn Gyongsan 38541 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea|Pusan Natl Univ Dept Chem Pusan 609735 South Korea|Pusan Natl Univ Chem Inst Funct Mat Pusan 609735 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Yeungnam Univ Sch Chem Engn Gyongsan 38541 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Korea Natl Univ Transportat Dept Polymer Sci & Engn Chungju 27469 South Korea;

    Pohang Univ Sci & Technol Dept Chem Engn Pohang 37673 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Pusan Natl Univ Dept Chem Pusan 609735 South Korea|Pusan Natl Univ Chem Inst Funct Mat Pusan 609735 South Korea;

    Korea Res Inst Chem Technol Res Ctr Adv Specialty Chem Ulsan 44412 South Korea;

    Yeungnam Univ Sch Chem Engn Gyongsan 38541 South Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    high-k dielectrics; integrated electronics; operational stability; organic field-effect transistors; polymeric dielectrics; printed electronics;

    机译:高k电介质;集成电子;操作稳定性;有机场效应晶体管;聚合物电介质;印刷电子;

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