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首页> 外文期刊>Acta Physica Polonica. A >DEFECT PROFILE INDUCED BY FRICTION AND WEAR PROCESSES DETECTED BY POSITRON ANNIHILATION METHOD
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DEFECT PROFILE INDUCED BY FRICTION AND WEAR PROCESSES DETECTED BY POSITRON ANNIHILATION METHOD

机译:摩擦诱导的缺陷轮廓和正电子AN没法检测的磨损过程

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摘要

The positron annihilation studies of defect profile in Cu samples whose surfaces were exposed to the friction and wear processes are presented. The values of the S-parameter and its dependences on the depth from the Cu surface are the functions of the value of the load applied in the sliding contact between two metals. It indicates possibilities of applying the presented measurement method in the industry.
机译:提出了正电子ni没研究铜样品中表面暴露于摩擦和磨损过程的缺陷轮廓的方法。 S参数的值及其对距Cu表面深度的依赖性是施加在两种金属之间的滑动接触中的载荷值的函数。它表明了在行业中应用提出的测量方法的可能性。

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