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首页> 外文期刊>Acta Materialia >Dispersion forces and hamaker constants for intergranular films in silicon nitride from spatially resolved-valence electron energy loss spectrum imaging
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Dispersion forces and hamaker constants for intergranular films in silicon nitride from spatially resolved-valence electron energy loss spectrum imaging

机译:来自空间分辨价电子能量损失谱成像的氮化硅中晶间膜的分散力和hamaker常数

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摘要

The van der Waals(vdW) dispersion forces represent one of the fundamental long range inter- facial and surface forces in materials. The dispersion forces, for a set of materials in close proximity, arise from the electronic structure of the materials wherein the electrons in interatomic bonds acting as oscillat- ing dipoles exhibit and attractive interaction energy. These vdW dispersion forces, represented by a propor- tionality constant, the full spectral Hamaker constant(A), can be calculatied directly from optical property based electronic structure spectra such as the interband transition strength(Jcv) using the Lifshitz theory.
机译:范德华力(vdW)分散力代表了材料中基本的远距离界面和表面力之一。对于一组非常接近的材料,色散力来自材料的电子结构,其中原子间键中的电子充当振荡偶极子,并表现出有吸引力的相互作用能。这些vdW色散力,由比例常数,全光谱Hamaker常数(A)表示,可以使用Lifshitz理论直接从基于光学性质的电子结构光谱(如带间跃迁强度(Jcv))中计算出来。

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