In-situ the crystallization of silicate-class films on Al_2O_3

摘要

Silicate-glass films were grown by pulsed-laser deposition on single-crystal, basal-plane Al_2O_3 substrates which had been pre-thinned to electron transparency. Experiments were then performed at high temperature in the TEM, which allowed direct observation and video-recording of the crystalliza- tion process. The epitactic growth of pseudo-orthorhombic anorthite(CaAl_2Si_2O_8) and grossular (Ca_3Al_2Si_3O_12) on the basal Al_2O_3 surface was observed, emphasizing the role of the substrate as a "seed" for glass devitrification.