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Direct Synthesis of Co-doped Graphene on Dielectric Substrates Using Solid Carbon Sources

机译:使用固体碳源在介电基板上直接合成共掺杂石墨烯

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摘要

Direct synthesis of high-quality doped graphene on dielectric substrates without transfer is highly desired for simplified device processing in electronic applications. However, graphene synthesis directly on substrates suitable for device applications, though highly demanded, remains unattainable and challenging. Here, a simple and transfer-free synthesis of high-quality doped graphene on the dielectric substrate has been developed using a thin Cu layer as the top catalyst and polycyclic aromatic hydrocarbons as both carbon precursors and doping sources. N-doped and N, F-co-doped graphene have been achieved using TPB and F16CuPc as solid carbon sources, respectively. The growth conditions were systematically optimized and the as-grown doped graphene were well characterized. The growth strategy provides a controllable transfer-free route for high-quality doped graphene synthesis, which will facilitate the practical applications of graphene.Electronic supplementary materialThe online version of this article (doi:10.1007/s40820-015-0052-6) contains supplementary material, which is available to authorized users.
机译:为了简化电子应用中的器件处理,非常需要在介电基板上直接合成高质量的掺杂石墨烯而不进行转移。然而,尽管对石墨烯的要求很高,但直接在适合于设备应用的基板上直接进行石墨烯合成仍然是无法实现的,并且具有挑战性。在此,已经开发出一种简单且无转移的合成方法,该方法使用薄铜层作为顶部催化剂,多环芳烃作为碳前体和掺杂源,在介电基片上进行简单且无转移的合成。分别使用TPB和F16CuPc作为固体碳源可以实现N掺杂和N,F掺杂的石墨烯。系统地优化了生长条件,并很好地表征了生长中的掺杂石墨烯。该增长策略为高质量掺杂石墨烯的合成提供了可控的无转移途径,这将促进石墨烯的实际应用。电子补充材料本文的在线版本(doi:10.1007 / s40820-015-0052-6)包含补充资料,可供授权用户使用。

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