首页> 美国卫生研究院文献>Frontiers in Chemistry >Coupled Electrodeposition of Fe–Co–W Alloys: Thin Films and Nanowires
【2h】

Coupled Electrodeposition of Fe–Co–W Alloys: Thin Films and Nanowires

机译:Fe-Co-W合金的耦合电沉积:薄膜和纳米线

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The electrodeposition of Fe–Co–W alloys was examined using a rotating cylinder Hull (RCH) cell and conditions were determined to create nanowires. The metal ion reduction mechanism was a combination of induced and anomalous codeposition, with water reduction as a gas evolving side reaction, rending deposition into recesses a challenge. In thin film deposition, under kinetic control, the addition of Fe ions into the electrolyte, greatly reduced the Co partial current density, and thus it's content in the deposit. The change of Co partial current density was attributed to an anomalous codeposition behavior, but it had a minimal effect in changing the W wt% in the deposit, despite the expected inducing characteristic of Fe when codeposited with tungsten. Deposition conditions were determined to electrodeposit Fe–Co–W nanowires having similar concentration as the thin films. Nanowires were electrodeposited into polycarbonate membranes under pulsed current at room temperature.
机译:Fe-Co-W合金的电沉积使用旋转圆柱赫尔(RCH)池进行了检查,并确定了产生纳米线的条件。金属离子的还原机理是诱导和异常共沉积的结合,水的还原是气体进化出的副反应,使沉积到凹槽中成为一个挑战。在薄膜沉积中,在动力学控制下,将Fe离子添加到电解质中,大大降低了Co分流密度,从而降低了其在沉积物中的含量。 Co部分电流密度的变化归因于异常的共沉积行为,但尽管预期与钨共沉积时会产生Fe的诱导特性,但它对改变沉积物中的W wt%影响很小。确定沉积条件以电沉积浓度与薄膜相似的Fe–Co–W纳米线。在室温下在脉冲电流下将纳米线电沉积到聚碳酸酯膜中。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号