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The Rat Diabetes Susceptibility Locus Iddm4 And At Least One Additional Gene Are Required For Autoimmune Diabetes Induced By Viral Infection

机译:大鼠糖尿病易感性基因座Iddd4和至少一个其他基因对于病毒感染引起的自身免疫性糖尿病是必需的

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摘要

BBDR rats develop autoimmune diabetes mellitus only after challenge with environmental perturbants. These include polyinosinic:polycytidylic acid (poly I:C, a ligand of toll-like receptor 3), agents that deplete regulatory T cell populations (Tregs), and a non-beta-cell-cytopathic parvovirus (Kilham rat virus, KRV). The dominant diabetes susceptibility locus Iddm4 is required for diabetes induced by treatment with poly I:C plus Treg depletion. Iddm4 is penetrant in congenic heterozygote rats on the resistant WF background, and is 79% sensitive and 80% specific as a predictor of induced diabetes. Surprisingly, an analysis of 190 (BBDR × WF)F2 rats treated with KRV after brief exposure to poly I:C revealed that the BBDR origin allele of Iddm4 is necessary but not entirely sufficient for diabetes expression. A genome scan identified a locus on chromosome 17, designated Iddm20, that is also required for susceptibility to diabetes after exposure to KRV and poly I:C (LOD score 3.7). These data suggest that the expression of autoimmune diabetes is a complex process that requires both major histocompatibility complex (MHC) genes that confer susceptibility and additional genes like Iddm4 and Iddm20 that operate only in the context of specific environmental perturbants, amplifying the immune response and the rate of disease progression.
机译:BBDR大鼠只有在受到环境干扰物攻击后才会发展自身免疫性糖尿病。这些包括聚肌苷酸:聚胞苷酸(poly I:C,toll​​样受体3的配体),消耗调节性T细胞群体(Tregs)的药物和非β细胞性细小病毒(Kilham大鼠病毒,KRV) 。通过多聚I:C加Treg耗竭治疗诱导的糖尿病需要占主导地位的糖尿病易感性基因座Iddm4。 Iddm4在具有抗药性的WF背景下在同基因杂合子大鼠中具有渗透性,并具有79%的敏感性和80%的特异性,可作为诱发糖尿病的指标。出人意料的是,对短暂暴露于多聚I:C后用KRV治疗的190只(BBDR×WF)F2大鼠进行的分析显示,Iddm4的BBDR起源等位基因对于糖尿病表达是必要的,但并不完全足够。基因组扫描确定了17号染色​​体上的一个基因座,命名为Iddm20,在暴露于KRV和poly I:C后,糖尿病易感性也需要该基因座(LOD评分3.7)。这些数据表明,自身免疫性糖尿病的表达是一个复杂的过程,既需要赋予易感性的主要组织相容性复合体(MHC)基因,也需要仅在特定的环境干扰物作用下起作用的其他基因(如Iddm4和Iddm20),从而放大免疫应答和疾病进展速度。

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