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Boosting the Electrochemical Performance of Li1.2Mn0.54Ni0.13Co0.13O2 by AtomicLayer-Deposited CeO2 Coating

机译:原子增强Li1.2Mn0.54Ni0.13Co0.13O2的电化学性能。层沉积CeO2涂层

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摘要

It has been demonstrated that atomic layer deposition (ALD) provides an initially safeguarding, uniform ultrathin film of controllable thickness for lithium-ion battery electrodes. In this work, CeO2 thin films were deposited to modify the surface of lithium-rich Li1.2Mn0.54Ni0.13Co0.13O2 (LRNMC) particles via ALD. The film thicknesses were measured by transmission electron microscopy. For electrochemical performance, ∼2.5 nm CeO2 film, deposited by 50 ALD cycles (50Ce), was found to have the optimal thickness. At a 1 C rate and 55 °C in a voltage range of 2.0−4.8 V, an initial capacity of 199 mAh/g was achieved, which was 8% higher than that of the uncoated (UC) LRNMC particles. Also, 60.2% of the initial capacity was retained after 400 cycles of charge–discharge, compared to 22% capacity retention of UC after only 180 cycles of charge–discharge. A robust kinetic of electrochemical reaction was found on the CeO2-coated samples at 55 °C through electrochemical impedance spectroscopy. The conductivity of 50Ce was observed to be around 3 times higher than that of UC at 60–140 °C. The function of the CeO2 thin-film coating was interpreted as beingto increase substrate conductivity and to block the dissolution ofmetal ions during the charge–discharge process.
机译:已证明原子层沉积(ALD)为锂离子电池电极提供了最初可维护的,厚度可控的均匀,超薄薄膜。在这项工作中,沉积了CeO2薄膜以通过ALD改性富锂Li1.2Mn0.54Ni0.13Co0.13O2(LRNMC)颗粒的表面。膜厚度通过透射电子显微镜法测量。对于电化学性能,发现通过50个ALD循环(50Ce)沉积的〜2.5 nm CeO2膜具有最佳厚度。在1 C速率和55°C且电压范围为2.0-4.8 V时,初始容量为199 mAh / g,比未涂覆的(UC)LRNMC颗粒高8%。同样,在400次充放电后保留了60.2%的初始容量,而在仅进行180次充放电后,UC保留了22%的容量。通过电化学阻抗谱,在55°C的CeO2涂层样品上发现了强大的电化学反应动力学。在60–140°C下,观察到50Ce的电导率比UC高约3倍。 CeO2薄膜涂层的功能被解释为增加底物的电导率并阻止其溶解充放电过程中的金属离子。

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