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Effect of Heat and Plating Medium on Survival of Escherichia coli after Treatment with Radiomimetic Chemicals

机译:加热和电镀介质对模拟放射化学处理后大肠杆菌存活的影响

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摘要

Zampieri, Antonio (Palo Alto Medical Research Foundation, Palo Alto, Calif.), and Joseph Greenberg. Effect of heat and plating medium on survival of Escherichia coli after treatment with radiomimetic chemicals. J. Bacteriol. >89:931–936. 1965.—Survival of Escherichia coli strain S and its radioresistant mutant R4 after treatment with mitomycin C, azaserine, nitrogen mustard, 1-methyl-3-nitro-1-nitrosoguanidine, nitrofurazone, and proflavine was studied. With all agents except proflavine, R4 was more resistant than was S. Survival of strain S was greater on minimal glucose-salts medium than on Penassay (Difco), and greater on the latter than on Tryptone (Difco) agar; survival of S was greater when posttreatment incubation temperature was 45 C than when it was 37 C. Post-treatment plating medium or temperature had no effect on survival of R4. Visible light did not affect survival of S or R4. The survival curves of R4 were exponential; those of S exhibited decreasing sensitivity with time of exposure. With proflavine, photoactivation by visible light was demonstrable, but there was no difference in survival between S and R4. Survival of either strain was not affected by post-treatment plating medium or incubation temperature.
机译:安东尼奥·赞皮里(Zampieri)(加利福尼亚州帕洛阿尔托的帕洛阿尔托医学研究基金会)和约瑟夫·格林伯格。加热和电镀介质对放射模拟化学处理后大肠杆菌存活的影响。 J.细菌。 > 89: 931–936。 1965年。研究了用丝裂霉素C,氮杂嘌呤,氮芥,1-甲基-3-硝基-1-亚硝基胍,硝呋喃酮和黄酮处理后的大肠杆菌S菌株及其抗辐射突变R4的存活情况。在除黄酮前体以外的所有试剂下,R4的抗药性均高于S。在最低限度的葡萄糖盐培养基中,菌株S的存活率高于Penassay(Difco)的琼脂;而在胰蛋白p(Difco)琼脂上的存活率更高。处理后孵育温度为45°C时,S的存活率高于37°C。处理后的平板培养基或温度对R4的存活率没有影响。可见光不影响S或R4的存活。 R4的存活曲线是指数的; S的那些表现出随着暴露时间而降低的敏感性。对于黄酮,可见光可以进行光激活,但是S和R4的存活率没有差异。任一菌株的存活率均不受后处理平板培养基或培养温度的影响。

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